- Patent Title: Three dimensional memory device and method for fabricating the same
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Application No.: US16782093Application Date: 2020-02-05
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Publication No.: US11315826B2Publication Date: 2022-04-26
- Inventor: Erh-Kun Lai , Hsiang-Lan Lung
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L21/764 ; H01L27/11582 ; H01L23/528 ; H01L21/28 ; H01L21/02 ; H01L21/768 ; H01L21/311

Abstract:
A three-dimensional memory device includes a substrate, a plurality of horizontal conductive layers, a plurality of vertical memory structures and a vertical conductive post. The conductive layers are located above the substrate, and immediately-adjacent two of the conductive layers are spaced by a first air gap. The memory structures pass through the conductive layers and are connected to the substrate. The conductive post is located between immediately-adjacent two of the memory structures and passes through the conductive layers and is connected to the substrate. The conductive post is spaced from immediately-adjacent edges of the conductive layers by a second air gap.
Public/Granted literature
- US20210242072A1 THREE DIMENSIONAL MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2021-08-05
Information query
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