Invention Grant
- Patent Title: Alignment mark, substrate and manufacturing method therefor, and exposure alignment method
-
Application No.: US16634741Application Date: 2018-09-07
-
Publication No.: US11315882B2Publication Date: 2022-04-26
- Inventor: Qinglin Ma , Baojie Zhao , Conghui Zhou , Li Wang , Jian Li , Yan Zhao , Xiang Hui , Xiongwei Wang , Chunhong Ma
- Applicant: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Inner Mongolia; CN Beijing
- Assignee: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Inner Mongolia; CN Beijing
- Agency: McDermott Will & Emery LLP
- Priority: CN201711242791.9 20171130
- International Application: PCT/CN2018/104655 WO 20180907
- International Announcement: WO2019/105098 WO 20190606
- Main IPC: H01L23/544
- IPC: H01L23/544 ; G03F1/40 ; G03F1/42 ; G03F9/00
Abstract:
An alignment mark includes an alignment region, a peripheral region and a shielding region. The alignment region has an outer contour; the peripheral region is disposed around at least a part of the outer contour of the alignment region; the shielding region is disposed around at least a part of the outer contour of the alignment region and is non-overlapped with the peripheral region; and the alignment region and the shielding region are opaque, and the peripheral region is at least partially transparent.
Information query
IPC分类:
