Invention Grant
- Patent Title: Semiconductor structure and semiconductor layout structure
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Application No.: US16865429Application Date: 2020-05-04
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Publication No.: US11315918B2Publication Date: 2022-04-26
- Inventor: Hsih-Yang Chiu
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: CKC & Partners Co., LLC
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L27/112 ; H01L23/528 ; H01L23/525 ; H01L23/522

Abstract:
A semiconductor layout structure includes a substrate, a plurality of gate structures, and a plurality of conductive structures. The substrate includes a plurality of active regions extending along a first direction, in which the active regions are separated from each other by an isolation structure. The transistors are respectively disposed in the active regions. The gate structures extend across the active regions along a second direction that is perpendicular to the first direction, in which each of the active regions includes a pair of source/drain portions at opposite sides of each of the gate structures. The conductive structures are embedded in a first portion of the isolation structure disposed between the adjacent active regions in the first direction, wherein the conductive structures extend along the second direction and are separated from the source/drain portions by the isolation structure.
Public/Granted literature
- US20210343695A1 SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR LAYOUT STRUCTURE Public/Granted day:2021-11-04
Information query
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