Invention Grant
- Patent Title: Array substrate and method of manufacturing same
-
Application No.: US16605417Application Date: 2019-09-18
-
Publication No.: US11315958B2Publication Date: 2022-04-26
- Inventor: Fei Ai , Dewei Song , Guoheng Yin
- Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Wuhan
- Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Wuhan
- Agency: Nathan & Associates
- Agent Menachem Nathan
- Priority: CN201910415368.7 20190517
- International Application: PCT/CN2019/106316 WO 20190918
- International Announcement: WO2020/232926 WO 20201126
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786 ; H01L29/66 ; G02F1/1368

Abstract:
An array substrate and a method of manufacturing the same are provided. The array substrate includes a substrate, a plurality of thin film transistors disposed on the substrate, and a planarization layer covering the plurality of thin film transistors and filled a region defined by the plurality of thin film transistors and the substrate.
Public/Granted literature
- US20220059578A1 ARRAY SUBSTRATE AND METHOD OF MANUFACTURING SAME Public/Granted day:2022-02-24
Information query
IPC分类: