Invention Grant
- Patent Title: Porous region structure and method of manufacture thereof
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Application No.: US17095202Application Date: 2020-11-11
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Publication No.: US11316006B2Publication Date: 2022-04-26
- Inventor: Frédéric Voiron , Julien El Sabahy , Guy Parat
- Applicant: Murata Manufacturing Co., Ltd. , COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: JP Nagaokakyo; FR Paris
- Assignee: Murata Manufacturing Co., Ltd.,COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: Murata Manufacturing Co., Ltd.,COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: JP Nagaokakyo; FR Paris
- Agency: ArentFox Schiff LLP
- Priority: EP18305582 20180511
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/32 ; C25D11/18 ; H01L49/02 ; C25D11/02

Abstract:
A porous region structure and a method of fabrication thereof are disclosed. The porous region structure is characterized by having a hard mask interface region with non-uniform pores sealed and thereby excluded functionally from the structure. The sealing of the hard mask interface region is done using a hard mask deposited on top of an anodization hard mask used to define the porous region of the structure. By excluding the hard mask interface region, the porosity ratio and the equivalent specific surface of the porous region structure can be controlled or quantified with higher accuracy. Corrosion due to exposure of an underlying metal layer of the structure is also significantly reduced by sealing the hard mask interface region.
Public/Granted literature
- US20210066449A1 POROUS REGION STRUCTURE AND METHOD OF MANUFACTURE THEREOF Public/Granted day:2021-03-04
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