Invention Grant
- Patent Title: Semiconductor device and method
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Application No.: US16561585Application Date: 2019-09-05
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Publication No.: US11316020B2Publication Date: 2022-04-26
- Inventor: Sylvain Leomant , Georg Ehrentraut , Maximilian Roesch
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: EP18193028 20180906
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/40 ; H01L29/78 ; H01L29/10 ; H01L21/02 ; H01L21/765 ; H01L29/739

Abstract:
In an embodiment, a semiconductor device includes a semiconductor substrate having a first major surface, a trench extending from the first major surface into the semiconductor substrate and having a base and a side wall extending form the base to the first major surface, and a field plate arranged in the trench and an enclosed cavity in the trench. The enclosed cavity is defined by insulating material and is laterally positioned between a side wall of the field plate and the side wall of the trench.
Public/Granted literature
- US20200083335A1 Semiconductor Device and Method Public/Granted day:2020-03-12
Information query
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