Invention Grant
- Patent Title: Junction barrier schottky diode
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Application No.: US17263365Application Date: 2020-05-09
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Publication No.: US11316052B2Publication Date: 2022-04-26
- Inventor: Qingwen Song , Xiaoyan Tang , Yuming Zhang , Hao Yuan , Chao Han
- Applicant: Xidian University
- Applicant Address: CN Xi'an
- Assignee: Xidian University
- Current Assignee: Xidian University
- Current Assignee Address: CN Xi'an
- Agency: WPAT, PC
- Priority: CN201910458036.7 20190529,CN201910458045.6 20190529
- International Application: PCT/CN2020/089347 WO 20200509
- International Announcement: WO2020/238587 WO 20201203
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/47

Abstract:
A junction barrier schottky (JBS) diode is provided and includes: a bottom metal layer, a N+-type substrate layer and a N−-type epitaxial layer sequentially arranged in that order from bottom to top, P-type ion injection regions are disposed on an upper surface of the N−-type epitaxial layer, distances of the P-type ion injection regions are gradually increased along a direction from an edge to a center of the JBS diode; an isolation dielectric layer is arranged on a periphery of the upper surface of the N−-type epitaxial layer, an top metal layer is arranged on the upper surface of the N−-type epitaxial layer and an upper surface of the isolation dielectric layer and further is in contact with the P-type ion injection regions. The JBS diode can effectively inhibit an occurrence of local electromigration and improve a device reliability.
Public/Granted literature
- US20210296512A1 JUNCTION BARRIER SCHOTTKY DIODE Public/Granted day:2021-09-23
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