- Patent Title: Methods and devices for growing oxide crystals in oxygen atmosphere
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Application No.: US16903334Application Date: 2020-06-16
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Publication No.: US11319645B2Publication Date: 2022-05-03
- Inventor: Yu Wang , Weiming Guan , Min Li
- Applicant: MEISHAN BOYA ADVANCED MATERIALS CO., LTD.
- Applicant Address: CN Sichuan
- Assignee: MEISHAN BOYA ADVANCED MATERIALS CO., LTD.
- Current Assignee: MEISHAN BOYA ADVANCED MATERIALS CO., LTD.
- Current Assignee Address: CN Sichuan
- Agency: Metis IP LLC
- Main IPC: C30B29/22
- IPC: C30B29/22 ; C01B33/20 ; C30B15/02

Abstract:
The present disclosure discloses a method for growing a crystal in oxygen atmosphere. The method may include compensating a weight of a reactant, introducing a flowing gas, improving a volume ratio of oxygen during a cooling process, providing a heater in a temperature field, and optimizing parameters. According to the method, problems may be solved, for example, cracking and component deviation of the crystal during a crystal growth process, and without oxygen-free vacancy. The method for growing the crystal may have excellent repeatability and crystal performance consistency.
Public/Granted literature
- US20210054527A1 METHODS AND DEVICES FOR GROWING OXIDE CRYSTALS WITHOUT ANNEALING Public/Granted day:2021-02-25
Information query
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