Invention Grant
- Patent Title: Gallium arsenide single crystal substrate
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Application No.: US17288153Application Date: 2019-07-10
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Publication No.: US11319646B2Publication Date: 2022-05-03
- Inventor: Hiroshi Fukunaga , Masanori Morishita , Tatsuya Moriwake , Katsushi Hashio
- Applicant: Sumitomo Electric Industries, Ltd.
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Faegre Drinker Biddle & Reath LLP
- International Application: PCT/JP2019/027270 WO 20190710
- International Announcement: WO2021/005731 WO 20210114
- Main IPC: C30B29/42
- IPC: C30B29/42

Abstract:
The gallium arsenide single crystal substrate has a circular main surface, and when the diameter of the main surface of the gallium arsenide single crystal substrate is represented by D and the number of etch pits formed on the main surface by immersing the gallium arsenide single crystal substrate in molten potassium hydroxide at 500° C. for 10 minutes is counted, the number C1 of etch pits in a first circular region having a diameter of 0.2D around the center of the main surface is 0 or more and 10 or less.
Public/Granted literature
- US20210310155A1 GALLIUM ARSENIDE SINGLE CRYSTAL SUBSTRATE Public/Granted day:2021-10-07
Information query
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