Invention Grant
- Patent Title: Method of laser irradiation of a patterned semiconductor device
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Application No.: US16963147Application Date: 2019-01-14
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Publication No.: US11322358B2Publication Date: 2022-05-03
- Inventor: Karim Huet , Fulvio Mazzamuto , Cyril Dutems
- Applicant: LASER SYSTEMS & SOLUTIONS OF EUROPE
- Applicant Address: FR Gennevilliers
- Assignee: LASER SYSTEMS & SOLUTIONS OF EUROPE
- Current Assignee: LASER SYSTEMS & SOLUTIONS OF EUROPE
- Current Assignee Address: FR Gennevilliers
- Agency: Nixon & Vanderhye
- Priority: EP18305036 20180118
- International Application: PCT/EP2019/050839 WO 20190114
- International Announcement: WO2019/141635 WO 20190725
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/268 ; B23K26/0622 ; B23K26/064 ; B23K26/067 ; G02B27/28 ; B23K101/40

Abstract:
Disclosed is a method of laser irradiation of a patterned semiconductor device including a periodic array of sub-wavelength fin-like structures, all fin-like structures upstanding from a base face of the semiconductor device and defining an upper face of the periodic array opposite the base face, each fin-like structure having: a width along a first direction parallel to the base face of the order of magnitude or smaller than the laser wavelength; a length along a second direction parallel to the base face and perpendicular to the first direction at least 3 times greater than the width; and a height along a third direction perpendicular to the base face. The method includes: generating a UV pulsed laser beam using a laser module; and irradiating at least a portion of the upper face with the laser beam.
Public/Granted literature
- US20210125831A1 METHOD OF LASER IRRADIATION OF A PATTERNED SEMICONDUCTOR DEVICE Public/Granted day:2021-04-29
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