According to one embodiment, storage device comprises first wiring layers stacked along a first direction and a memory pillar extending through the first wiring layers. The memory pillar includes a first semiconductor layer. A second wiring layer is above an upper end of the memory pillar. A second semiconductor layer has a first portion between the first semiconductor layer and the second wiring layer and a second portion extending away from the first semiconductor layer. A first insulating layer is between the first portion and the second wiring layer in first direction, and also between the second portion and the second wiring layer in a second direction intersecting the first direction.