Invention Grant
- Patent Title: Manufacturing method of thin film transistor pattern using different color masks and multilayer photoresists, thin film transistor, and mask thereof
-
Application No.: US16647537Application Date: 2020-01-16
-
Publication No.: US11322528B2Publication Date: 2022-05-03
- Inventor: Shuting Zhong , Ning Zhang
- Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Priority: CN201911354912.8 20191225
- International Application: PCT/CN2020/072361 WO 20200116
- International Announcement: WO2021/128518 WO 20210701
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G03F1/00 ; G03F7/20
Abstract:
The present disclosure provides a manufacturing method of a TFT pattern, and a mask, which is used to make light pass through a hole corresponding to a position of the TFTs on the mask which is disposed on the TFTs, thereby producing two or more stacked photoresists on the TFTs to counteract a reflected light on a semiconductor As layer and ensure normal working of the TFTs.
Public/Granted literature
- US20220005843A1 MANUFACTURING METHOD OF THIN FILM TRANSISTOR PATTERN, THIN FILM TRANSISTOR, AND MASK Public/Granted day:2022-01-06
Information query
IPC分类:
