Invention Grant
- Patent Title: Solid state image sensor tolerant to misalignment and having a high photoelectric conversion efficiency
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Application No.: US14773269Application Date: 2014-02-28
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Publication No.: US11322533B2Publication Date: 2022-05-03
- Inventor: Shinya Yamakawa
- Applicant: SONY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Chip Law Group
- Priority: JPJP2013-052076 20130314
- International Application: PCT/JP2014/055008 WO 20140228
- International Announcement: WO2014/141900 WO 20140918
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H04N5/374 ; H04N5/361

Abstract:
There is provided a solid state image sensor including a photoelectric conversion unit formed and embedded in a semiconductor substrate, an impurity region that retains an electric charge generated by the photoelectric conversion unit, and a transfer transistor that transfers the electric charge to the impurity region. A gate electrode of the transfer transistor is formed in a depth direction toward the photoelectric conversion unit in the semiconductor substrate, from a surface of the semiconductor substrate on which the impurity region is formed. A channel portion of the transfer transistor is surrounded by the gate electrode in two or more directions other than a direction of the impurity region, as seen from the depth direction.
Public/Granted literature
- US20160020237A1 SOLID STATE IMAGE SENSOR, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE Public/Granted day:2016-01-21
Information query
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