• Patent Title: Solid state image sensor tolerant to misalignment and having a high photoelectric conversion efficiency
  • Application No.: US14773269
    Application Date: 2014-02-28
  • Publication No.: US11322533B2
    Publication Date: 2022-05-03
  • Inventor: Shinya Yamakawa
  • Applicant: SONY CORPORATION
  • Applicant Address: JP Tokyo
  • Assignee: SONY CORPORATION
  • Current Assignee: SONY CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Chip Law Group
  • Priority: JPJP2013-052076 20130314
  • International Application: PCT/JP2014/055008 WO 20140228
  • International Announcement: WO2014/141900 WO 20140918
  • Main IPC: H01L27/146
  • IPC: H01L27/146 H04N5/374 H04N5/361
Solid state image sensor tolerant to misalignment and having a high photoelectric conversion efficiency
Abstract:
There is provided a solid state image sensor including a photoelectric conversion unit formed and embedded in a semiconductor substrate, an impurity region that retains an electric charge generated by the photoelectric conversion unit, and a transfer transistor that transfers the electric charge to the impurity region. A gate electrode of the transfer transistor is formed in a depth direction toward the photoelectric conversion unit in the semiconductor substrate, from a surface of the semiconductor substrate on which the impurity region is formed. A channel portion of the transfer transistor is surrounded by the gate electrode in two or more directions other than a direction of the impurity region, as seen from the depth direction.
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