Array substrate with first gate, second gate, binding region with hole, and manufacturing method of same
Abstract:
The present application provides an array substrate and a manufacturing method of the same, the array substrate includes a display region, the display region includes a thin film transistor structure layer including a gate electrode layer and a source drain electrode layer, wherein the gate electrode layer and the source drain electrode layer are made of an alloy material including one or a group selected from Al, Ge, Nd, Ta, Zr, Ni, or La.
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