Invention Grant
- Patent Title: Gas processing device
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Application No.: US17283225Application Date: 2019-09-11
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Publication No.: US11325095B2Publication Date: 2022-05-10
- Inventor: Kenichi Sabatake , Kohei Shigeta
- Applicant: Ushio Denki Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Ushio Denki Kabushiki Kaisha
- Current Assignee: Ushio Denki Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JPJP2018-204299 20181030
- International Application: PCT/JP2019/035659 WO 20190911
- International Announcement: WO2020/090238 WO 20200507
- Main IPC: B01J19/12
- IPC: B01J19/12 ; A61L9/015 ; A61L9/20 ; B01J19/00

Abstract:
A gas processing device includes: a casing that includes a first end having a first opening region constituting an intake port, a second end having a second opening region constituting an exhaust port, and a main body portion on the inside of which is formed a hollow portion; a discharge lamp that has a tube body which is disposed in the hollow portion and which has a shape extending in the first direction, a first electrode, and a second electrode, the discharge lamp that emits ultraviolet rays from the tube body; a power supply unit arranged outside the casing; and a first power supply line and a second power supply line that are wired so as to pass through a side closer to the first end than the main body portion, and that electrically connect the power supply unit to the first electrode and the second electrode.
Public/Granted literature
- US20210346861A1 GAS PROCESSING DEVICE Public/Granted day:2021-11-11
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