Invention Grant
- Patent Title: Method for producing relief-pattern formation, apparatus for producing the same, and seal
-
Application No.: US17194897Application Date: 2021-03-08
-
Publication No.: US11325298B2Publication Date: 2022-05-10
- Inventor: Koichi Shinoda
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2015-098019 20150513
- Main IPC: B29C59/04
- IPC: B29C59/04 ; B32B38/06 ; B29D11/00 ; B32B37/00 ; B32B38/10 ; B32B39/00 ; B32B38/00 ; B32B38/16 ; B29C35/08 ; B32B37/20 ; G02B5/18 ; H01L21/027 ; H01L51/00 ; G09F19/12 ; G09F3/02 ; G02B1/12 ; H01L51/52

Abstract:
A method and an apparatus for producing a relief-pattern forming, the method and apparatus being suitable for producing a film-like material, such as an embossed film, having a fine relief-structure pattern formed on a surface thereof so as to have a distinctive optical effect with higher quality, good productivity, and fewer defects. A transfer pattern printed layer having an inverted structure of a relief-structure pattern is formed on a second substrate by printing a transfer pattern onto the surface of a first substrate on which the relief-structure pattern is formed at a predetermined position by registration with the relief-structure pattern followed by drying, laminating with the second substrate, curing and peeling.
Public/Granted literature
- US20210187821A1 METHOD FOR PRODUCING RELIEF-PATTERN FORMATION, APPARATUS FOR PRODUCING THE SAME, AND SEAL Public/Granted day:2021-06-24
Information query