The present disclosure is directed to a thermal developing assembly that is configured to reduce (or eliminate) the reactivity of contaminants and/or unreacted photosensitive material associated with forming a relief image on a photosensitive printing element during thermal development. The thermal developing assembly is configured to reduce (or eliminate) the reactivity of a byproduct associated with forming a relief image on a photosensitive printing element, the byproduct including but not limited to, contaminants within vapors (e.g., fumes), contaminants within condensate, unreacted photosensitive material, and combinations thereof.