Invention Grant
- Patent Title: Transparent nanolayered structure having improved wear-resistant and flexibility
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Application No.: US16775563Application Date: 2020-01-29
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Publication No.: US11326247B2Publication Date: 2022-05-10
- Inventor: Dae-Eun Kim , Oleksiy Penkov , Kuk Jin Seo
- Applicant: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- Applicant Address: KR Seoul
- Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- Current Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- Current Assignee Address: KR Seoul
- Agency: Hauptman Ham, LLP
- Priority: KR10-2019-0011876 20190130
- Main IPC: C23C14/06
- IPC: C23C14/06 ; C23C14/35 ; C03C17/34 ; C23C14/00
Abstract:
Provided is a transparent structure having improved wear resistance and flexibility, and a structure according to the present invention is a nanolayered structure in which a nitride nanofilm of one or more elements selected from metals and metalloids; and a boron nitride nanofilm are alternately layered.
Public/Granted literature
- US20200239999A1 TRANSPARENT NANOLAYERED STRUCTURE HAVING IMPROVED WEAR-RESISTANT AND FLEXIBILITY Public/Granted day:2020-07-30
Information query
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