• Patent Title: PVD process for the deposition of Al2O3 and a coated cutting tool with at least one layer of Al2O3
  • Application No.: US16761867
    Application Date: 2018-11-07
  • Publication No.: US11326248B2
    Publication Date: 2022-05-10
  • Inventor: Dominic DiechleVeit Schier
  • Applicant: WALTER AG
  • Applicant Address: DE Tubingen
  • Assignee: WALTER AG
  • Current Assignee: WALTER AG
  • Current Assignee Address: DE Tubingen
  • Agent Corinne R. Gorski
  • Priority: EP17200385 20171107
  • International Application: PCT/EP2018/080459 WO 20181107
  • International Announcement: WO2019/092009 WO 20190516
  • Main IPC: B23B27/14
  • IPC: B23B27/14 C23C14/08 C23C14/00 C23C14/34 C23C14/35 C23C14/06
PVD process for the deposition of Al2O3 and a coated cutting tool with at least one layer of Al2O3
Abstract:
A coated cutting tool including a substrate and a single layer or multi-layer hard material coating is provided. The substrate is selected from cemented carbide, cermet, ceramics, cubic boron nitride (cBN), polycrystalline diamond, steel or high-speed steel. The hard material coating includes at least one layer of gamma-Al2O3, exhibiting particularly high hardness and reduced Young's modulus. The gamma-Al2O3 layer of the coated cutting tool is obtainable by means of a reactive magnetron sputtering process using at least one Al target, wherein the deposition is carried out using a reaction gas composition of argon (Ar) and oxygen (O2) at a total reaction gas pressure within the range from at least 1 Pa to at most 5 Pa, at an O2 partial pressure within the range from 0.001 Pa to 0.1 Pa, and at a temperature within the range from 400° C. to 600° C.
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