Invention Grant
- Patent Title: ALD reactor for coating porous substrates
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Application No.: US14175396Application Date: 2014-02-07
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Publication No.: US11326255B2Publication Date: 2022-05-10
- Inventor: Anil U. Mane , Joseph Libera , Jeffrey W. Elam
- Applicant: UChicago Argonne LLC
- Applicant Address: US IL Argonne
- Assignee: UChicago Argonne LLC
- Current Assignee: UChicago Argonne LLC
- Current Assignee Address: US IL Argonne
- Agency: Foley & Lardner LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; H01J43/24 ; C04B38/00 ; C23C16/04
Abstract:
A system and method for improved atomic layer deposition. The system includes a top showerhead plate, a substrate and a bottom showerhead plate. The substrate includes a porous microchannel plate and a substrate holder is positioned in the system to insure flow-through of the gas precursor.
Public/Granted literature
- US20140220244A1 ALD REACTOR FOR COATING POROUS SUBSTRATES Public/Granted day:2014-08-07
Information query
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