Invention Grant
- Patent Title: Photoresist composition and process for producing photoresist pattern
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Application No.: US15993194Application Date: 2018-05-30
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Publication No.: US11327399B2Publication Date: 2022-05-10
- Inventor: Tatsuro Masuyama , Masahiko Shimada , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2017-111926 20170606
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/038 ; G03F7/16 ; G03F7/38 ; G03F7/32 ; C08F220/16 ; G03F7/20 ; C09D125/18 ; C08F220/22 ; C08F220/30 ; C08F220/18
Abstract:
A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
Public/Granted literature
- US20180348632A1 PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2018-12-06
Information query
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