Invention Grant
- Patent Title: Substrate processing apparatus and article manufacturing method
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Application No.: US17320464Application Date: 2021-05-14
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Publication No.: US11327411B2Publication Date: 2022-05-10
- Inventor: Mitsuhide Nishimura , Kenichi Kamino , Kashu Matsumoto
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JPJP2019-048747 20190315
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G05B19/042 ; H01L21/027 ; H01L21/68 ; H01L21/687
Abstract:
The present invention provides a substrate processing apparatus that processes a substrate, the apparatus including a stage configured to hold and move the substrate, a conveying unit configured to hold and convey the substrate between conveying unit and the stage, an accumulation unit configured to accumulate control information concerning the stage and the conveying unit which is generated by processing the substrate, and a determination unit configured to determine a conveying procedure when conveying the substrate between the stage and the conveying unit by selecting one of a plurality of conveying procedures which can be set for the stage and the conveying unit based on control information accumulated in the accumulation unit.
Public/Granted literature
- US20210271177A1 SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD Public/Granted day:2021-09-02
Information query
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