Invention Grant
- Patent Title: Semiconductor structure
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Application No.: US16868883Application Date: 2020-05-07
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Publication No.: US11329192B2Publication Date: 2022-05-10
- Inventor: Hsin-Chiao Fang , Shen-Jie Wang , Yen-Lin Lai
- Applicant: PlayNitride Display Co., Ltd.
- Applicant Address: TW Zhunan Township, Miaoli County
- Assignee: PlayNitride Display Co., Ltd.
- Current Assignee: PlayNitride Display Co., Ltd.
- Current Assignee Address: TW Zhunan Township, Miaoli County
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW108140246 20191106
- Main IPC: H01L33/32
- IPC: H01L33/32 ; H01L33/12 ; H01L33/02 ; H01L33/00

Abstract:
The embodiment of the present disclosure provides a semiconductor structure. The semiconductor structure includes a substrate. The semiconductor structure also includes a first buffer layer disposed on the substrate. The semiconductor structure further includes a second buffer layer disposed on the first buffer layer. The semiconductor structure includes a semiconductor-based layer disposed on the second buffer layer. The second buffer layer includes aluminum, and the aluminum content of the second buffer layer gradually increases in the direction away from the substrate.
Public/Granted literature
- US20210135051A1 SEMICONDUCTOR STRUCTURE Public/Granted day:2021-05-06
Information query
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