Invention Grant
- Patent Title: Nonvolatile memory apparatus including resistive-change material layer
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Application No.: US17060884Application Date: 2020-10-01
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Publication No.: US11329223B2Publication Date: 2022-05-10
- Inventor: Minhyun Lee , Seongjun Park , Hyunjae Song , Hyeonjin Shin , Kibum Kim , Sanghun Lee , Yunho Kang
- Applicant: Samsung Electronics Co., Ltd. , SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Applicant Address: KR Suwon-si; KR Seoul
- Assignee: Samsung Electronics Co., Ltd.,SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Current Assignee: Samsung Electronics Co., Ltd.,SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Current Assignee Address: KR Suwon-si; KR Seoul
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0138453 20171024
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L21/768 ; G11C13/00

Abstract:
A nonvolatile memory apparatus includes a first electrode, a second electrode separated from the first electrode, a resistive-change material layer provided between the first electrode and the second electrode and configured to store information due to a resistance change caused by an electrical signal applied through the first electrode and the second electrode, and a diffusion prevention layer provided between the first electrode and the resistive-change material layer and/or between the second electrode and the resistive-change material layer and including a two-dimensional (2D) material having a monolayer thickness of about 0.35 nm or less.
Public/Granted literature
- US20210020835A1 NONVOLATILE MEMORY APPARATUS INCLUDING RESISTIVE-CHANGE MATERIAL LAYER Public/Granted day:2021-01-21
Information query
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