Invention Grant
- Patent Title: Gas diffusion electrode substrate and method for producing gas diffusion electrode substrate
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Application No.: US17345222Application Date: 2021-06-11
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Publication No.: US11329293B2Publication Date: 2022-05-10
- Inventor: Masamichi Utsunomiya , Yasuaki Tanimura , Toshiya Kamae
- Applicant: TORAY INDUSTRIES, INC.
- Applicant Address: JP Tokyo
- Assignee: TORAY INDUSTRIES, INC.
- Current Assignee: TORAY INDUSTRIES, INC.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-228574 20141111
- Main IPC: H01M4/88
- IPC: H01M4/88 ; H01M4/96 ; H01M8/02 ; B05D7/24 ; B05D1/26 ; B32B9/04 ; B32B5/18 ; H01M4/86 ; H01M8/10

Abstract:
The purpose of the present invention is to provide: a method for producing a gas diffusion electrode base which enables the achievement of a gas diffusion electrode base that has a microporous layer with small surface roughness and is not susceptible to damaging an electrolyte membrane; and a gas diffusion electrode base that has a microporous layer with small surface roughness and is not susceptible to damaging an electrolyte membrane. For the purpose of achieving the above-described purpose, the present invention has the configuration described below. Namely, a specific gas diffusion electrode base which has a carbon sheet and a microporous layer, and wherein the carbon sheet is porous and the DBP oil absorption of a carbon powder contained in the microporous layer is 70-155 ml/100 g.
Public/Granted literature
- US20210305584A1 GAS DIFFUSION ELECTRODE SUBSTRATE AND METHOD FOR PRODUCING GAS DIFFUSION ELECTRODE SUBSTRATE Public/Granted day:2021-09-30
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