Invention Grant
- Patent Title: Antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
-
Application No.: US15774034Application Date: 2016-11-17
-
Publication No.: US11332625B2Publication Date: 2022-05-17
- Inventor: Tai Yeon Lee , Mike Scianna , Paulus Steeman , Marco Driessen , Johan Jansen , Sainath Vaidya
- Applicant: Covestro (Netherlands) B.V.
- Applicant Address: NL Nieuwegein
- Assignee: Covestro (Netherlands) B.V.
- Current Assignee: Covestro (Netherlands) B.V.
- Current Assignee Address: NL Nieuwegein
- Agent Jed C. Benson
- International Application: PCT/US2016/062440 WO 20161117
- International Announcement: WO2017/087614 WO 20170526
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; C09D7/63 ; B33Y70/00 ; B33Y10/00 ; C08G59/68 ; C08G65/18 ; C08G59/22 ; B29C64/124 ; B22C9/04 ; C08G59/24 ; C09D163/00 ; B29K105/00

Abstract:
Radiation curable compositions for additive fabrication are described and claimed. Such compositions are particularly suited for investment casting applications, and include a cationically polymerizable component, a radically polymerizable component, a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator, and a free-radical photoinitiator. In other embodiments, the composition may also include a photosensitizer and/or a UV/absorber. Also described and claimed is a method for using a liquid radiation curable resin for additive fabrication with a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator and a certain type of prescribed photosensitizer in an investment casting process.
Public/Granted literature
Information query