Invention Grant
- Patent Title: Thermal substrate with high-resistance magnification and positive temperature coefficient ink
-
Application No.: US17147901Application Date: 2021-01-13
-
Publication No.: US11332632B2Publication Date: 2022-05-17
- Inventor: Shuyong Xiao , Richard C. Abbott
- Applicant: LMS Consulting Group, LLC
- Applicant Address: US OH Marion
- Assignee: LMS Consulting Group, LLC
- Current Assignee: LMS Consulting Group, LLC
- Current Assignee Address: US OH Marion
- Agency: Stratford Group Ltd.
- Main IPC: C09D11/52
- IPC: C09D11/52 ; C09D11/102 ; H05B3/14 ; H05K1/09 ; C09D11/107 ; H05K1/02 ; C09D11/10 ; H05B3/34 ; H05K1/03 ; C09D11/037 ; H05K1/16 ; H05K3/12
Abstract:
An article comprising a heater that comprises a high-resistance magnification (HRM) PTC ink deposited on a flexible substrate to form one or more resistors. The HRM PTC ink has a resistance magnification of at least 20 in a temperature range of at least 20 degrees Celsius above a switching temperature of the ink, the resistance magnification being defined as a ratio between a resistance of the double-resin ink at a temperature ‘T’ and a resistance of the double-resin ink at 25 degrees Celsius.
Public/Granted literature
- US20210130634A1 THERMAL SUBSTRATE WITH HIGH-RESISTANCE MAGNIFICATION AND POSITIVE TEMPERATURE COEFFICIENT INK Public/Granted day:2021-05-06
Information query
IPC分类:
