Invention Grant
- Patent Title: Electrode holder, and method for producing electrode for aluminum electrolytic capacitor
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Application No.: US16483406Application Date: 2017-12-07
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Publication No.: US11332841B2Publication Date: 2022-05-17
- Inventor: Yuta Shimizu , Masahiko Katano , Toshifumi Taira , Shinya Sone
- Applicant: NIPPON LIGHT METAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: NIPPON LIGHT METAL COMPANY, LTD.
- Current Assignee: NIPPON LIGHT METAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Priority: JPJP2017-022761 20170210
- International Application: PCT/JP2017/043999 WO 20171207
- International Announcement: WO2018/146931 WO 20180816
- Main IPC: C25D11/00
- IPC: C25D11/00 ; C25D11/04 ; C25D17/06 ; H01G9/00 ; H01G9/045 ; H01G9/052 ; H01G9/055

Abstract:
An electrode holder and a method for producing an electrode for an aluminum electrolytic capacitor are provided that enable prevention of exfoliation of a porous layer during chemical formation even when the porous layer is formed on an aluminum electrode so as to have a thickness of 200 micrometers or greater. When an aluminum electrode 10 having at least one surface 11 on which a porous layer 17 having a thickness of 200 micrometers or greater is formed is subjected to chemical formation in a chemical formation solution, the aluminum electrode 10 is held by an electrode holder 50. The electrode holder 50 includes: an insulating first support plate 51 configured to overlap the one surface 11 of the aluminum electrode 10; an insulating second support plate 52 configured to overlap the other surface 12 of the aluminum electrode 10; and a connecting part 53 configured to connect the first support plate 51 and the second support plate 52 to each other. A portion of the first support plate 51 that overlaps the porous layer 17 while being in contact therewith is formed with a porous member 510.
Public/Granted literature
- US20200013555A1 ELECTRODE HOLDER, AND METHOD FOR PRODUCING ELECTRODE FOR ALUMINIUM ELECTROLYTIC CAPACITOR Public/Granted day:2020-01-09
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