Invention Grant
- Patent Title: Projection system and projector
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Application No.: US17155171Application Date: 2021-01-22
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Publication No.: US11333957B2Publication Date: 2022-05-17
- Inventor: Hirotaka Yanagisawa
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2020-009802 20200124
- Main IPC: G03B21/14
- IPC: G03B21/14 ; G02B13/16 ; G03B21/28 ; G02B17/08

Abstract:
A projection system includes a first optical system, a second optical system including a first optical element and a second optical element and disposed on the enlargement side of the first optical system, and a placement mechanism configured to selectively place one of the first and second optical elements on a first optical axis of the first optical system. The first optical element has a first light incident surface, a first reflection surface disposed on the enlargement side of the first light incident surface, and a first light exiting surface disposed on the enlargement side of the first reflection surface. The second optical element has a second light incident surface, a second reflection surface disposed on the enlargement side of the second light incident surface, and a second light exiting surface disposed on the enlargement side of the second reflection surface.
Public/Granted literature
- US20210232035A1 PROJECTION SYSTEM AND PROJECTOR Public/Granted day:2021-07-29
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