Invention Grant
- Patent Title: Onium salt, chemically amplified resist composition, and patterning process
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Application No.: US16660081Application Date: 2019-10-22
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Publication No.: US11333974B2Publication Date: 2022-05-17
- Inventor: Masahiro Fukushima
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JPJP2018-199659 20181024
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/32 ; C07C381/12 ; C07C309/12 ; C07C309/13 ; C07C309/19 ; C08L33/14 ; G03F7/20 ; G03F7/039 ; G03F7/38
Abstract:
A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in exposure latitude, MEF, and LWR.
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