Invention Grant
- Patent Title: Magnetoresistance effect element and heusler alloy
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Application No.: US16984389Application Date: 2020-08-04
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Publication No.: US11335365B2Publication Date: 2022-05-17
- Inventor: Kazuumi Inubushi , Katsuyuki Nakada
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2019-146332 20190808
- Main IPC: G11B5/39
- IPC: G11B5/39 ; G01R33/09 ; G11C11/16 ; H01L43/02 ; H01L43/08 ; H01L43/10

Abstract:
A magnetoresistance effect element and a Heusler alloy in which a state change due to annealing does not easily occur. The element includes a first ferromagnetic layer, a second ferromagnetic layer, and a non-magnetic layer positioned between the first ferromagnetic layer and the second ferromagnetic layer, in which at least one of the first ferromagnetic layer and the second ferromagnetic layer is a Heusler alloy in which a portion of elements of an alloy represented by Co2FeαZβ is substituted with a substitution element, in which Z is one or more elements selected from the group consisting of Al, Si, Ga, Ge, and Sn, α and β satisfy 2.3≤α+β, α
Public/Granted literature
- US20210043226A1 MAGNETORESISTANCE EFFECT ELEMENT AND HEUSLER ALLOY Public/Granted day:2021-02-11
Information query
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