Invention Grant
- Patent Title: Error measurement device of linear stage and error measurement method of linear stage
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Application No.: US17071510Application Date: 2020-10-15
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Publication No.: US11335580B2Publication Date: 2022-05-17
- Inventor: Chien-Sheng Liu , Jie-Yu Zeng
- Applicant: National Cheng Kung University
- Applicant Address: TW Tainan
- Assignee: National Cheng Kung University
- Current Assignee: National Cheng Kung University
- Current Assignee Address: TW Tainan
- Agency: Rabin & Berdo, P.C.
- Priority: TW109113549 20200422
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/68

Abstract:
An error measurement device and an error measurement method are provided. The optical measurement assembly of the error measurement device includes a light source, an optical lens, and a photoelectric sensor. The light beam emitted by the light source is transmitted to a sensing area on the photoelectric sensor to form a first optical path illuminating on a first light-spot position of the sensing area. The moving stage is moved by a linear displacement, so that the light beam is transmitted to the photoelectric sensor to form a second optical path illuminating on a second light-spot position of the sensing area. The processor calculates a movement error of the moving stage and controls the actuator to drive one or more of the light source, the optical lens, and the photoelectric sensor to perform a relative motion, so that the light beam illuminates on the first light-spot position again.
Public/Granted literature
- US20210335643A1 ERROR MEASUREMENT DEVICE OF LINEAR STAGE AND ERROR MEASUREMENT METHOD OF LINEAR STAGE Public/Granted day:2021-10-28
Information query
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