Disclosed is a method of manufacturing a polyorganosiloxane-based stamp comprising providing a master including a transfer pattern surface; forming a first layer of a first curable composition onto the transfer pattern surface such that the first layer includes a relief pattern of said transfer pattern; partially curing the first layer; depositing a second layer of a second curable composition onto the partially cured first layer; co-curing the partially cured first layer and the second layer to form a cured first layer having a first Young's modulus, adhered to a cured second layer having a second Young's modulus smaller than the first Young's modulus; depositing a third layer of a third curable composition onto the second layer, and curing the third layer to form a cured third layer adhered to the cured second layer. Further disclosed is a polyorganosiloxane-based stamp obtainable from the method; use of the same for printing process; and an imprinting method using the same.