Invention Grant
- Patent Title: Silicon carbide ingot manufacturing method and silicon carbide ingot manufactured thereby
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Application No.: US17408727Application Date: 2021-08-23
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Publication No.: US11339497B2Publication Date: 2022-05-24
- Inventor: Jong Hwi Park , Kap-Ryeol Ku , Jung-Gyu Kim , Jung Woo Choi , Sang Ki Ko , Byung Kyu Jang , Eun Su Yang , Jung Doo Seo
- Applicant: SENIC INC.
- Applicant Address: KR Cheonan-si
- Assignee: SENIC INC.
- Current Assignee: SENIC INC.
- Current Assignee Address: KR Cheonan-si
- Agency: NSIP Law
- Priority: KR10-2020-0110065 20200831,KR10-2020-0162868 20201127
- Main IPC: C30B23/06
- IPC: C30B23/06 ; C30B23/00 ; C30B29/36

Abstract:
A silicon carbide ingot manufacturing method and a silicon carbide ingot manufacturing system are provided. The silicon carbide ingot manufacturing method and the silicon carbide ingot manufacturing system may change a temperature gradient depending on the growth of an ingot by implementing a guide which has a tilted angle to an external direction from the interior of a reactor, in an operation to grow an ingot during a silicon carbide ingot manufacturing process.
Public/Granted literature
- US20220064817A1 SILICON CARBIDE INGOT MANUFACTURING METHOD AND SILICON CARBIDE INGOT MANUFACTURED THEREBY Public/Granted day:2022-03-03
Information query
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