Invention Grant
- Patent Title: Method of making printed circuit board and laminated structure
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Application No.: US16633271Application Date: 2018-12-17
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Publication No.: US11343918B2Publication Date: 2022-05-24
- Inventor: Shigeaki Uemura , Eiko Imazaki , Koji Nitta , Yoshio Oka , Hideki Matsuoka , Ippei Tanaka , Takayuki Yonezawa
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: IPUSA, PLLC
- Priority: JPJP2017-244121 20171220
- International Application: PCT/JP2018/046337 WO 20181217
- International Announcement: WO2019/124307 WO 20190627
- Main IPC: H05K1/00
- IPC: H05K1/00 ; H05K1/02 ; H05K1/03 ; H05K1/11 ; H05K1/16 ; H05K3/00 ; H05K3/02 ; H05K3/06 ; H05K3/10 ; H05K3/18 ; H05K3/22 ; H05K3/38 ; H05K3/46 ; B24C1/00 ; B24C1/04 ; B24C3/00 ; B24C3/32 ; G06F3/044 ; G03F7/00 ; G03F7/004 ; G03F7/027 ; G03F7/031 ; G03F7/033 ; G03F7/039 ; G03F7/085 ; G03F7/12

Abstract:
A method of making a printed circuit board includes a step of providing a double-sided plate that is an insulating substrate having conductive layers on respective surfaces thereof, a first coating step of coating a first surface of the double-sided plate with a first photosensitive resin film, a second coating step of coating a second surface of the double-sided plate with a second photosensitive resin film, a first exposure step of exposing the photosensitive resin film coating the first surface after the first and second coating steps, and a second exposure step of exposing the photosensitive resin film coating the second surface after the first exposure step, wherein a maximum depth of a depression in an outermost surface of the second photosensitive resin film used in the second exposure step is less than 1.0 μm.
Public/Granted literature
- US20210045250A1 METHOD OF MAKING PRINTED CIRCUIT BOARD AND LAMINATED STRUCTURE Public/Granted day:2021-02-11
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