Invention Grant
- Patent Title: Method for manufacturing tilted mesa and method for manufacturing detector
-
Application No.: US17031608Application Date: 2020-09-24
-
Publication No.: US11349043B2Publication Date: 2022-05-31
- Inventor: Xingye Zhou , Zhihong Feng , Yuanjie Lv , Xin Tan , Xubo Song , Jia Li , Yulong Fang , Yuangang Wang
- Applicant: THE 13TH RESEARCH INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION
- Applicant Address: CN Shijiazhuang
- Assignee: THE 13TH RESEARCH INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION
- Current Assignee: THE 13TH RESEARCH INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION
- Current Assignee Address: CN Shijiazhuang
- Agency: Slater Matsil, LLP
- Priority: CN201810420959.9 20180504
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0224 ; H01L31/0312 ; H01L31/0352 ; H01L31/107

Abstract:
The disclosure is related to the technical field of semiconductors, and provides a method for manufacturing a tilted mesa and a method for manufacturing a detector. The method for manufacturing a tilted mesa comprises: coating a photoresist layer on a mesa region of a chip; heating the chip on which the photoresist layer is coated from a first preset temperature to a second preset temperature; performing etching processing on the heated chip, so as to manufacture a mesa having a preset tilting angle; and removing the photoresist layer on the mesa region of the chip after the mesa is manufactured.
Public/Granted literature
- US20210020801A1 Method for Manufacturing Tilted Mesa and Method for Manufacturing Detector Public/Granted day:2021-01-21
Information query
IPC分类: