- Patent Title: Glassy carbon mask for immersion implant and selective laser anneal
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Application No.: US16895997Application Date: 2020-06-08
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Publication No.: US11349061B2Publication Date: 2022-05-31
- Inventor: Steven J. Holmes , Devendra K. Sadana , Brent A. Wacaser , Damon Brooks Farmer
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Venable LLP
- Agent Henry J. Daley
- Main IPC: H01L39/24
- IPC: H01L39/24 ; H01L39/12
Abstract:
According to an embodiment of the present invention, a method of producing a computing device includes providing a semiconductor substrate, and patterning a mask on the semiconductor substrate, the mask exposing a first portion of the semiconductor substrate and covering a second portion of the semiconductor substrate. The method includes implanting the first portion of the semiconductor substrate with a dopant. The method includes annealing the first portion of the semiconductor substrate to form an annealed doped region, while maintaining the second portion of the semiconductor substrate as an unannealed portion.
Public/Granted literature
- US20210384405A1 GLASSY CARBON MASK FOR IMMERSION IMPLANT AND SELECTIVE LASER ANNEAL Public/Granted day:2021-12-09
Information query
IPC分类:
