Invention Grant
- Patent Title: Aqueous composition and cleaning method using same
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Application No.: US17047571Application Date: 2019-04-25
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Publication No.: US11352593B2Publication Date: 2022-06-07
- Inventor: Akinobu Horita , Toshiyuki Oie , Takahiro Kikunaga , Kenji Yamada
- Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Applicant Address: JP Chiyoda-ku
- Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2018-086662 20180427
- International Application: PCT/JP2019/017588 WO 20190425
- International Announcement: WO2019/208686 WO 20191031
- Main IPC: C11D7/08
- IPC: C11D7/08 ; C11D7/28 ; C11D7/36 ; C11D11/00 ; C23F1/16

Abstract:
An aqueous composition may include: (A) a fluoride ion supply source in an amount that gives a fluoride ion concentration of 0.05 to 30 mmol/L in the composition; (B) a cation supply source in an amount that gives a mole ratio of cations of 0.3 to 20 to the fluoride ions in the composition; and (C) 0.0001 to 10 mass % of one or more compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the composition, wherein pH is in a range of from 2 to 6.
Public/Granted literature
- US20210155881A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME Public/Granted day:2021-05-27
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