Invention Grant
- Patent Title: Boron aluminum oxide compound deposited by atomic layer deposition on product used for radiation shielding
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Application No.: US16857641Application Date: 2020-04-24
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Publication No.: US11352693B1Publication Date: 2022-06-07
- Inventor: Vivek Dwivedi
- Applicant: United States of America as represented by the Administrator of NASA
- Applicant Address: US DC Washington
- Assignee: United States of America as represented by the Administrator of NASA
- Current Assignee: United States of America as represented by the Administrator of NASA
- Current Assignee Address: US DC Washington
- Agent Matthew F. Johnston; Bryan A. Geurts; Helen M. Galus
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/40 ; C23C16/04 ; C23C16/26 ; C23C16/455

Abstract:
The present invention relates to utilizing atomic layer deposition (ALD) techniques to deposit a layer of boron compound in a light-weight composite carbon-based foam derived from natural precursors, graphene, or other carbon-based materials, to minimize the effects of radiation in space applications. A method of manufacturing radiation shielding material includes: preparing a carbon-based foam product in a predetermined volume; and doping the carbon-based foam product by depositing a boron or boron-10 aluminum oxide (B/B10—Al—O) compound using ALD in a vacuum chamber on either carbon-based foam or spherical silica particles prior to generating a carbon-based foam; wherein doping the carbon-based foam product includes depositing the boron10-Al—O compound at a thickness of between one and two atomic percent of boron-10 within the carbon-based foam or on the silica particles; or coating a percentage of average foam pores (50% of average foam pore diameter) of the carbon-based foam product with the boron10-Al—O compound.
Information query
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