• Patent Title: Photomask for manufacturing active switch and method for manufacturing display panel
  • Application No.: US16349986
    Application Date: 2018-12-04
  • Publication No.: US11353787B2
    Publication Date: 2022-06-07
  • Inventor: Chuan Wu
  • Applicant: HKC CORPORATION LIMITED
  • Applicant Address: CN Shenzhen
  • Assignee: HKC CORPORATION LIMITED
  • Current Assignee: HKC CORPORATION LIMITED
  • Current Assignee Address: CN Shenzhen
  • Priority: CN201811389226.X 20181121
  • International Application: PCT/CN2018/119061 WO 20181204
  • International Announcement: WO2020/103187 WO 20200528
  • Main IPC: G03F1/54
  • IPC: G03F1/54
Photomask for manufacturing active switch and method for manufacturing display panel
Abstract:
The present application discloses a photomask for manufacturing an active switch and a method for manufacturing a display panel. The photomask includes a light shielding region, a semi-transmissive region, a light transmitting region and a hollowed-out region, where the light shielding region corresponds to a metal layer of the active switch and is configured to be lighttight; the semi-transmissive region corresponds to a channel region of the active switch, and is configured to be partially transmissive; the light transmitting region is a photomask region other than the light shielding region and the semi-transmissive region and is configured to be completely transmissive; and the hollowed-out region is located within the semi-transmissive region and is configured to be completely transmissive.
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