Invention Grant
- Patent Title: Photomask for manufacturing active switch and method for manufacturing display panel
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Application No.: US16349986Application Date: 2018-12-04
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Publication No.: US11353787B2Publication Date: 2022-06-07
- Inventor: Chuan Wu
- Applicant: HKC CORPORATION LIMITED
- Applicant Address: CN Shenzhen
- Assignee: HKC CORPORATION LIMITED
- Current Assignee: HKC CORPORATION LIMITED
- Current Assignee Address: CN Shenzhen
- Priority: CN201811389226.X 20181121
- International Application: PCT/CN2018/119061 WO 20181204
- International Announcement: WO2020/103187 WO 20200528
- Main IPC: G03F1/54
- IPC: G03F1/54

Abstract:
The present application discloses a photomask for manufacturing an active switch and a method for manufacturing a display panel. The photomask includes a light shielding region, a semi-transmissive region, a light transmitting region and a hollowed-out region, where the light shielding region corresponds to a metal layer of the active switch and is configured to be lighttight; the semi-transmissive region corresponds to a channel region of the active switch, and is configured to be partially transmissive; the light transmitting region is a photomask region other than the light shielding region and the semi-transmissive region and is configured to be completely transmissive; and the hollowed-out region is located within the semi-transmissive region and is configured to be completely transmissive.
Public/Granted literature
- US20220004095A1 PHOTOMASK FOR MANUFACTURING ACTIVE SWITCH AND METHOD FOR MANUFACTURING DISPLAY PANEL Public/Granted day:2022-01-06
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