- Patent Title: Resin, resist composition and method for producing resist pattern
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Application No.: US16741815Application Date: 2020-01-14
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Publication No.: US11353790B2Publication Date: 2022-06-07
- Inventor: Mutsuko Higo , Shingo Fujita , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JPJP2019-007244 20190118
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; C08F220/18 ; C08F212/14 ; C08F220/38 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38

Abstract:
Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)h3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1′ represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni≤5.
Public/Granted literature
- US20200233301A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2020-07-23
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