Invention Grant
- Patent Title: Photoresist stripper
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Application No.: US16222248Application Date: 2018-12-17
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Publication No.: US11353794B2Publication Date: 2022-06-07
- Inventor: Richard Dalton Peters , Michael T. Phenis
- Applicant: Versum Materials US, LLC
- Applicant Address: US AZ Tempe
- Assignee: Versum Materials US, LLC
- Current Assignee: Versum Materials US, LLC
- Current Assignee Address: US AZ Tempe
- Agent William T. Slaven, IV
- Main IPC: G03F7/42
- IPC: G03F7/42 ; C11D11/00 ; C11D3/43 ; C11D3/00 ; C11D1/00 ; C11D3/20 ; C11D3/04 ; C11D3/30 ; C11D3/34 ; B32B3/06 ; E04F15/02

Abstract:
Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about 0° C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulations can additionally contain a secondary solvent. The formulations do not contain tetramethylammonium hydroxide. Methods for use of the stripping solutions are additionally provided.
Public/Granted literature
- US20190196337A1 Photoresist Stripper Public/Granted day:2019-06-27
Information query
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