Invention Grant
- Patent Title: Model-adaptive multi-source large-scale mask projection 3D printing system
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Application No.: US17002772Application Date: 2020-08-25
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Publication No.: US11353845B2Publication Date: 2022-06-07
- Inventor: Lifang Wu , Lidong Zhao , Zechao Liu , Jiankang Qiu , Xiaohua Guo , Meng Jian , Ziming Zhang
- Applicant: BEIJING UNIVERSITY OF TECHNOLOGY
- Applicant Address: CN Beijing
- Assignee: BEIJING UNIVERSITY OF TECHNOLOGY
- Current Assignee: BEIJING UNIVERSITY OF TECHNOLOGY
- Current Assignee Address: CN Beijing
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Main IPC: G05B19/4099
- IPC: G05B19/4099 ; H04N9/31

Abstract:
A model-adaptive multi-source large-scale mask projection 3D printing system configured to conduct the following steps: projecting pure-color images of first and second colors having identical attributes, capturing an image of an overlapping portion and calculating height and width information of the overlapping portion; splitting a pre-processed slice and respectively recording width and height information of two slices resulting from the splitting and generating two gray scale images having identical attributes thereto; counting power values of identical positions of slices in different gray scale values, performing a further calculation to obtain a projection mapping function, using the projection mapping function as a basis for performing optimization on gray scale interpolation of the generated images; and fusing the processed gray scale images and the originally split two slices to obtain a mask projection 3D printing slice having a uniform shaping brightness, and forming a final product.
Public/Granted literature
- US20210018897A1 Model-Adaptive Multi-Source Large-Scale Mask Projection 3D Printing System Public/Granted day:2021-01-21
Information query
IPC分类: