Invention Grant
- Patent Title: Methods and apparatus for dynamical control of radial uniformity in microwave chambers
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Application No.: US16218848Application Date: 2018-12-13
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Publication No.: US11355317B2Publication Date: 2022-06-07
- Inventor: Satoru Kobayashi , Lance Scudder , David Britz , Soonam Park , Dmitry Lubomirsky , Hideo Sugai
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67
Abstract:
Plasma is generated in a semiconductor process chamber by a plurality of microwave inputs with slow or fast rotation. Radial uniformity of the plasma is controlled by regulating the power ratio of a center-high mode and an edge-high mode of the plurality of microwave inputs into a microwave cavity. The radial uniformity of the generated plasma in a plasma chamber is attained by adjusting the power ratio for the two modes without inputting time-splitting parameters for each mode.
Public/Granted literature
- US20190189399A1 METHODS AND APPARATUS FOR DYNAMICAL CONTROL OF RADIAL UNIFORMITY IN MICROWAVE CHAMBERS Public/Granted day:2019-06-20
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