Invention Grant
- Patent Title: Decentralized substrate handling and processing system
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Application No.: US16946964Application Date: 2020-07-13
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Publication No.: US11355368B2Publication Date: 2022-06-07
- Inventor: Scott Gregory Lloyd
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/68 ; G01B11/00 ; H01L21/687

Abstract:
An electronics manufacturing system includes a first substrate transfer via having position detection sensors to detect a position of a substrate in the first substrate transfer via and flow-controlled valves to inject inert gas through a floor and move the substrate in a predetermined direction with reference to the position within the first substrate transfer via by adjusting a pressure of the inert gas underneath the substrate. A processing chamber is coupled to the first substrate transfer via and having a pedestal with apertures and flow-controlled devices to inject inert gas through the apertures to receive the substrate from the first substrate transfer via and move the substrate into a second substrate transfer via after processing of the substrate.
Public/Granted literature
- US20220013384A1 DECENTRALIZED SUBSTRATE HANDLING AND PROCESSING SYSTEM Public/Granted day:2022-01-13
Information query
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