Invention Grant
- Patent Title: Device-like overlay metrology targets displaying Moiré effects
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Application No.: US16931078Application Date: 2020-07-16
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Publication No.: US11355375B2Publication Date: 2022-06-07
- Inventor: Roie Volkovich , Liran Yerushalmi , Raviv Yohanan , Mark Ghinovker
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01L21/68
- IPC: H01L21/68 ; G01B11/27 ; G03F7/20

Abstract:
A metrology system and metrology methods are disclosed. The metrology system comprises a set of device features on a first layer of a sample, a first set of target features on a second layer of the sample and overlapping the set of device features, and a second set of target features on the second layer of the sample and overlapping the set of device features. Relative positions of a first set of Moiré fringes and a second set of Moiré fringes indicate overlay error between the first layer of the sample and the second layer of the sample.
Public/Granted literature
- US20220020625A1 DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS Public/Granted day:2022-01-20
Information query
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