A semiconductor device having a fuse structure includes a region of semiconductor material having a major surface. A dielectric region is over the major surface. A first fuse terminal is over a first part of the dielectric region, a second fuse terminal is over a second part of the dielectric region and spaced apart from the first fuse terminal to provide a gap region, and a fuse body over a third part of the dielectric region interposed between and connected to the first fuse terminal and the second fuse terminal. A dummy structure is over the dielectric region in the gap region on a first side of the fuse body, the dummy structure spaced apart and electrically isolated from the fuse body, the first fuse terminal, and the second fuse terminal. The dummy structure is configured to reduce the presence of or reduce the effects of defects, such as cracks or voids that can emanate from the fuse structure.