Invention Grant
- Patent Title: Connection structure and method for producing same
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Application No.: US16957568Application Date: 2018-12-27
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Publication No.: US11355469B2Publication Date: 2022-06-07
- Inventor: Tetsuyuki Shirakawa , Takahiro Fukui , Shinnosuke Iwamoto
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: JPJP2017-254726 20171228
- International Application: PCT/JP2018/048242 WO 20181227
- International Announcement: WO2019/131904 WO 20190704
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
One aspect of the invention is a method of manufacturing a connection structure, including disposing an adhesive layer between a first electronic member including a first substrate and a first electrode formed on the first substrate and a second electronic member including a second substrate and a second electrode formed on the second substrate, and pressure-bonding the first electronic member and the second electronic member via the adhesive layer such that the first electrode and the second electrode are electrically connected to each other, wherein the first electronic member further including an insulating layer formed on a side of the first electrode opposite to the first substrate, and the adhesive layer including: a first conductive particle being a dendritic conductive particle; and a second conductive particle being a conductive particle other than the first conductive particle and having a non-conductive core and a conductive layer provided on the core.
Public/Granted literature
- US20200321305A1 CONNECTION STRUCTURE AND METHOD FOR PRODUCING SAME Public/Granted day:2020-10-08
Information query
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