Invention Grant
- Patent Title: Integrated circuit layout method, device, and system
-
Application No.: US16936175Application Date: 2020-07-22
-
Publication No.: US11355488B2Publication Date: 2022-06-07
- Inventor: Chien-Ying Chen , Lee-Chung Lu , Li-Chun Tien , Ta-Pen Guo
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L27/02 ; G06F30/392

Abstract:
A method of generating a layout diagram of an IC cell includes defining a boundary recess in a boundary of the cell by extending a first portion of the boundary along a first gate track, extending a second portion of the boundary from the first gate track to a second gate track, the second portion being contiguous with the first portion, and extending a third portion of the boundary from the first gate track to the second gate track, the third portion being contiguous with the first portion. An active region is positioned in the cell by extending the active region across a third gate track, wherein the first gate track is between the second gate track and the third gate track. The layout diagram is stored on a non-transitory computer-readable medium.
Public/Granted literature
- US20200350307A1 INTEGRATED CIRCUIT LAYOUT METHOD, DEVICE, AND SYSTEM Public/Granted day:2020-11-05
Information query
IPC分类: