Invention Grant
- Patent Title: Semiconductor device including a plug connected to a bit line and containing tungsten
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Application No.: US16800163Application Date: 2020-02-25
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Publication No.: US11355512B2Publication Date: 2022-06-07
- Inventor: Jun Iijima , Masayoshi Tagami , Masayuki Kitamura , Satoshi Wakatsuki
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JPJP2019-167476 20190913
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L21/768 ; H01L27/11575

Abstract:
A semiconductor device includes a substrate, a logic circuit provided on the substrate, a wiring layer including a plurality of wirings that are provided above the logic circuit, a first insulating film below the wiring layer, a plug, and a second insulating film. Each of the wirings contains copper and extends along a surface plane of the substrate in a first direction. The wirings are arranged along the surface plane of the substrate in a second direction different from the first direction. The plug extends through the first insulating film in a third direction crossing the first and second directions and is electrically connected to one of the wirings. The plug contains tungsten. The second insulating film is provided between the first insulating film and the plug.
Public/Granted literature
- US20210082944A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-03-18
Information query
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